2025-05-04
Based in Sweden, NSS Water specializes in pioneering water technology, delivering nanopure water solutions for high-tech industries and beyond. Their patented Water Enhancement Tool (WET) technology produces Nanopure® Water (NPW), the purest water with no particles larger than 5 nanometers that enables advancements in semiconductor manufacturing. This advanced point-of-use system enables industries like semiconductors to enhance production efficiency by reducing water usage by up to 90%, lowering chemical consumption, and minimizing environmental impact.
Semiconductor Growth Demands for More and Better Higher-than-Ultrapure Water
Ultrapure water is used in various applications, including for research, semiconductor manufacturing, and more. Focusing on its application in semiconductor manufacturing, ultrapure water is used for a variety of purposes, ranging from equipment cooling to wafer surface cleaning. According to MKS Instruments, a typical 200 mm wafer fab that processes 20,000 wafers per month can use up to 3,000 m3 (3 million liters) of UPW per day, which is equivalent of the daily water requirements of 20,000 people. While UPW has been the conventional material, it still has some contamination from <10,000 nm particulates, which can still cause product contamination or impact process efficiency, making even purer water necessary to improve the wafer manufacturing success rate, reduce water usage, and reduce manufacturing cost.
Introducing IC Taiwan Grand Challenge
To boost Taiwan’s position as a global semiconductor powerhouse, the National Science and Technology Council (NSTC) organizes the IC Taiwan Grand Challenge. Focusing on teams actively leveraging innovative IC design to develop advanced application solutions or enhanced technologies, the ICTGC puts special attention on teams in the fields of AI Core Technologies and Chips, Smart Mobility, Smart Manufacturing, Smart Medtech, and Sustainability. NSS Water was selected as one of the winners in the Sustainability category with their WET technology.
WET Technology Provides the Purest Water in the World
NSS Water was officially founded in 2020 and is backed by +7 years of R&D experience to develop its Water Enhancement Tool (WET) technology. To produce the world’s purest water through innovative, eco-friendly solutions that minimize environmental impact, NSS Water aims to preserve precious resources, drastically reduce water usage, and support industries in achieving sustainable operations. By providing ultrapure water with minimal waste, NSS Water can help reduce water and chemical usage in semiconductor manufacturing.
As the global demand for high-purity water free of nano-contamination grows, it is important to secure water purity and avoid “killer particles” in water is necessary for the production of advanced semiconductors. Their WET technology revolutionizes the production of UPW by significantly improving purity and reducing the volume of UPW needed. The produced Nanopure® water (NPW) removes all nano contamination above 5-10 nanometers, which helps the semiconductor industry to reach significantly higher yields faster and reach profitability on new chips faster. The WET technology also reduces water consumption by up to 90% in certain production steps due to the extremely high purity of NPW.
Keen to meet the winners?
Unveil Event Open to Register!
- DATE: 5/22(Thur.) 13:00-15:00
- VENUE: Taipei Nangang Exhibition Center (TaiNEX) Halls 2 4F, Pi Stage at InnoVEX
- REGISTER NOW: https://lihi2.com/LBl8Q
